On Thursday, September 14, 2023, Patentix Corporation, founded by Professor Kentaro Kaneko of Ritsumeikan University’s Research Organization for Science and Technology, took the stage at the U-START UP KANSAI Open Pitch, a program to support university-launched startup business development, and received…
World’s first successful deposition of rutile-structured germanium dioxide (r-GeO2) on SiC by PhantomSVD（Phantom spatial vapor deposition）method.
Successful crystal growth of r-GeO2 thin films on SiC crystals with new crystal growth method of Phantom Spatial Vapor Deposition (SVD), paves the way for the realization of r-GeO2 power devices. ―Major Steps Toward Realization of r-GeO2 Power Devices ― Professor/RARA…
Press Release (Notice of Fund Raising)
Patentix Inc. August 31, 2023 The Patentix Corporation (Headquarters: Kusatsu City, Shiga Prefecture; CEO: Toyosuke IBI), which conducts research and development of semiconductor substrates and power devices using the ultra-wide band gap (UWBG) power semiconductor material germanium dioxide (GeO2), has raised…
Our company was selected for FASTAR, an acceleration program by SME Support Japan.
About FASTAR FASTAR is a growth acceleration program for companies and individuals aiming to solve social issues on a global scale and transform growth industries, in which appointed experts help them upgrade their business plans through accompaniment-type support with a view…
CTO Kaneko spoke at the seminar.
CTO Kaneko gave a presentation on the current status of export restrictions on gallium and germanium and their impact on the semiconductor industry in the future at a seminar for institutional investors hosted by SBI SECURITIES Co.,Ltd.