On Thursday, September 14, 2023, Patentix Corporation, founded by Professor Kentaro Kaneko of Ritsumeikan University’s Research Organization for Science and Technology, took the stage at the U-START UP KANSAI Open Pitch, a program to support university-launched startup business development, and received…
World’s first successful deposition of rutile-structured germanium dioxide (r-GeO2) on SiC by PhantomSVD（Phantom spatial vapor deposition）method.
Successful crystal growth of r-GeO2 thin films on SiC crystals with new crystal growth method of Phantom Spatial Vapor Deposition (SVD), paves the way for the realization of r-GeO2 power devices. ―Major Steps Toward Realization of r-GeO2 Power Devices ― Professor/RARA…
Press Release (Notice of Fund Raising)
Patentix Inc. August 31, 2023 The Patentix Corporation (Headquarters: Kusatsu City, Shiga Prefecture; CEO: Toyosuke IBI), which conducts research and development of semiconductor substrates and power devices using the ultra-wide band gap (UWBG) power semiconductor material germanium dioxide (GeO2), has raised…
中小機構によるアクセラレーション事業「FASTAR」に採択されました。
FASTARとは グローバル規模での社会課題解決や、成長産業の変革を目指している企業及び個人を対象に、資金調達や事業提携に向けて、担当の専門家が伴走型支援による事業計画のプラッシュアップを行う、成長加速化プログラムです。 当社は、今後の資金調達や事業提携等に向けて、FASTARを通じて、事業計画をしっかり立てて、事業計画の実行と検証を確実に行ってまいります。
Our company was selected for FASTAR, an acceleration program by SME Support Japan.
About FASTAR FASTAR is a growth acceleration program for companies and individuals aiming to solve social issues on a global scale and transform growth industries, in which appointed experts help them upgrade their business plans through accompaniment-type support with a view…
CTO Kaneko spoke at the seminar.
CTO Kaneko gave a presentation on the current status of export restrictions on gallium and germanium and their impact on the semiconductor industry in the future at a seminar for institutional investors hosted by SBI SECURITIES Co.,Ltd.